AZ P4620
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AZ P4620 is a type of positive photoresist.[1]
It is in the AZ P4000 series.[2]
It was produced by AZ Electronic Materials under Hoechst Celanese, and later by Merck.[3]
It has an amber-red appearance.[3]
Ingredients[edit]
- Propylene glycol methyl ether acetate (CAS 108-65-6) - 59 percent[3]
- Cresol novolak resin 117520-84-0
- Diazonaphthoquinone sulfonic acid etsers 5610-94-6
Specs[edit]
- Resist fim thickness range: Approx. 6 - 20 µm.[2]
References[edit]
- ↑ "AZ P4620 Photoresist". https://pnf.uchicago.edu/process/detail/az-p4620-photoresist/.
- ↑ 2.0 2.1 "New Photoresist AZ P4620 Photoresists MicroChemicals GmbH". https://web.archive.org/web/20150413072315if_/http://www.microchemicals.com/products/photoresists/az_p4620.html.
- ↑ 3.0 3.1 3.2 "AZ P4620 Material Safety Data Sheet". 1990-04-20. https://apps.mnc.umn.edu/pub/msds/az_p4620_photoresist.pdf.