AZ P4000
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AZ P4000 is a series of positive photoresists.[1]
It was produced by Hoechst Celanese.[2]
Characteristics[edit]
- Sensitive to g-, h-, and i-line light sources.[1]
- Recommended developers: KOH-based (e. g. AZ 400K) or TMAH-based (e. g. AZ 826 MIF)[1]
- Standard strippers (e. g. AZ 100 Remover, TechniStrip P1316)[1]
- Thinner and edge bead remover: AZ EBR Solvent = PGMEA[1]
Products/thickness grades[edit]
- AZ P4110[2]
- AZ P4210[3]
- AZ P4330[2]
- AZ P4330-RS[3]
- AZ P4400[3]
- AZ P4620 - a high viscosity formulation of the P4000 series.[2]
- AZ 4903[2]
References[edit]
- ↑ 1.0 1.1 1.2 1.3 1.4 "New Photoresist AZ P4620 Photoresists MicroChemicals GmbH". https://web.archive.org/web/20150413072315if_/http://www.microchemicals.com/products/photoresists/az_p4620.html.
- ↑ 2.0 2.1 2.2 2.3 2.4 "Lithographic Performance in Thick Photoresist Applications". https://www.lithoguru.com/scientist/litho_papers/1993_36_Lithographic%20Performance%20in%20Thick%20Photoresist%20Applications.pdf.
- ↑ 3.0 3.1 3.2 "Error: no
|title=specified when using {{Cite web}}". https://web.archive.org/web/20190810091848if_/https://www.microchemicals.com/micro/tds_az_p4000_series.pdf.