Optical lithography
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Optical lithography (also termed photolithograpy or UV lithography) is the patterning of masks and samples with photoresist prior to other processing steps (e.g. deposition, etching, doping).[1]
HMDS is applied first. Then photoresist. Then exposure happens. Then development.
Equipment[edit]
Exposure[edit]
HMDS[edit]
- TEL Mark Vz Coater (Tokyo Electron)[2][3]
Photoresist spinning[edit]
Development[edit]
References[edit]
- ↑ https://lnf-wiki.eecs.umich.edu/wiki/Optical_lithography
- ↑ "Used TEL / TOKYO ELECTRON MARK-Vz Equipment". 2024-04-12. https://moov.co/marketplace/coaters-and-developers/tel-tokyo-electron/tel-tokyo-electron-markvz.
- ↑ "Coat and Develop". 2023-08-30. https://shellbacksemi.com/products-upgrades/coat-develop/.