High-k dielectric
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A high-κ dielectric is a material with a high dielectric constant (κ, kappa).
High-k dielectrics are used as insulating layers in the construction of metal-oxide-semiconductor (MOS) transistors.
High-k dielectrics are employed to replace traditional silicon dioxide (SiO2) as gate insulators to improve performance.
Using High-k dielectrics allows for the creation of thinner insulating layers while still maintaining the required capacitance.
Materials commonly used as High-k dielectrics include hafnium oxide (HfO2) and zirconium oxide (ZrO2).