GCA 6300 DSW 5X
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The GCA 6300 DSW 5X g-line Wafer Stepper is a wafer stepper made by GCA in the mid 1980s.[1]
It uses 436nm (g-line) light from a 350W Mercury arc lamp source.[1] It has a 5X reduction lens. It can be operated in automatic or manual mode.
It can operate on substrates ranging from 150mm wafers down to small pieces of silicon. The maximum substrate thickness is 1.5 millimeters.[1]
A unit was installed at the Cornell NanoScale Facility.