Diffusion

From XVRWiki
Jump to navigation Jump to search

Diffusion is a process used to alter the electrical properties of a semiconductor material, typically silicon. The diffusion process involves the introduction of dopants into specific regions of a silicon wafer.

Diffusion has been done in two main categories: infinite source diffusion, and finite source diffusion.[1]

Diffusion has generally been replaced by implantation techniques recently to the year G2020.

References[edit]

  1. https://www.youtube.com/watch?v=2R-dN8dtSnM Stephen Remillard - Dopant Diffusion in Semiconductors, Lecture 26. Accessed June 12, 2024